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درباره محصول

What it is: A four-piece mini set of hydrating hair-care must-haves to wash, treat and style while repairing, protecting and smoothing all hair types and textures.

Hair Type: Fine, Medium, and Thick

Hair Texture: Straight, Wavy, Curly, and Coily

Hair Concerns:
- Dryness
- Frizz
- Straightening/Smoothing

Key Benefits:
- Nurture Hydrating Shampoo and Conditioner provide intensive nourishment for healthy hair without added weight
- Nurture Deep Moisture Mask delivers hydration and moisture to stressed-out hair
- Complete Hydrating Air Dry Cream smooths strands, rapidly reduces frizz, and provides soft daily hold

Highlighted Ingredients:
- Chia Seed and Linseed Extract: Natural film-formers for soft hold.
- Camellia Seed Oil: Moisturizes, softens, and adds shine.
- Aloe Leaf Juice: Hydrates hair.

Ingredient Callouts: These products are vegan, cruelty-free, and come in recyclable packaging.

What Else You Need to Know: This set contains the entire Nurture Collection, featuring Nurture Hydrating Shampoo, Conditioner, and Nurture Deep Moisture Mask, along with JVN`s best-selling Complete Air Dry Cream for soft, touchable hold and easy style. Use Nurture Hydrating Shampoo and Conditioner every shower, and Nurture Deep Moisture Mask on the days your hair needs extra hydration. 1.7 oz Recyclable glass bottle, dropper cap, FSC-certified carton (96% Plastic Free and recyclable) .

This Set Contains:
- 2 oz/ 60 mL Nurture Hydrating Shampoo
- 2 oz/ 60 mL Nurture Hydrating Conditioner
- 1 oz/ 30 mL Nurture Deep Moisture Mask
- 1 oz/ 30 mL Complete Hydrating Air Dry Cream

Clean + Planet Positive at Sephora
When you see our Clean + Planet Positive seal, this brand`s products are formulated without certain ingredients that are potentially harmful to human health and environment. They also address ingredients clients are concerned about, including phthalates, formaldehyde or formaldehyde releasers, oxybenzone and octinoxate, hydroquinone, triclosan, coal tar, methylisothiazolinone and methylchloroisothiazolinone, insoluble plastic microbeads, and more: For the full list, check out the Ingredients tab.
On top of meeting the Clean at Sephora formulated without list, these brands are on a mission to do right by your routine and the planet by making climate commitments and focusing on sustainable sourcing, responsible packaging, and environmental giving.

محتویات

-Chia Seed and Linseed Extract: Natural film-formers for soft hold.
-Camellia Seed Oil: Moisturizes, softens, and adds shine.
-Aloe Leaf Juice: Hydrates hair.

Nurture Hydrating Shampoo:
Water/Aqua/Eau, Aloe Barbadensis Leaf Juice, Sodium Methyl Cocoyl Taurate, Lauryl Glucoside, Cocamidopropyl Hydroxysultaine, Coco-Glucoside, Hydrogenated Farnesene, Glycerin, Panthenol, Pyrus Malus (Apple) Fruit Extract, Glyceryl Oleate, Tristearyl Citrate, Sorbitan Oleate Decylglucoside Crosspolymer, Guar Hydroxypropyltrimonium Chloride, Sodium Gluconate, Sodium Levulinate, Sodium Chloride, Potassium Sorbate, Benzyl Alcohol, Citric Acid, Fragrance/Parfum, Coumarin, Limonene, Linalool.

Nurture Hydrating Conditioner:
Water/Aqua/Eau, Stearyl Alcohol, Cetyl Alcohol, Hydrogenated Farnesene, Brassicamidopropyl Dimethylamine, Cinnamidopropyltrimonium Chloride, Squalane, Cetearyl Olivate, Camellia Japonica Seed Oil, Glycerin, Sodium PCA, Arginine, Glycine, Alanine, Serine, Proline, Valine, Threonine, Isoleucine, Histidine, Phenylalanine, PCA, Tocopherol, Sodium Lactate, Sorbitan Olivate, Aspartic Acid, Sodium Gluconate, Ethylhexylglycerin, Benzyl Alcohol, Fragrance/Parfum, Coumarin, Limonene, Linalool.

Nurture Deep Moisture Mask:
Water/Aqua/Eau, Stearyl Alcohol, Cetyl Alcohol, Hydrogenated Farnesene*, Brassicamidopropyl Dimethylamine, Cinnamidopropyltrimonium Chloride, Squalane, Glycerin, Camellia Japonica Seed Oil, Hydroxypropyltrimonium Hydrolyzed Rice Protein, Apple Cider Vinegar, Panthenol, Cetearyl Olivate, Tocopherol, Sorbitan Olivate, Ethylhexylglycerin, Aspartic Acid, Leuconostoc/Radish Root Ferment Filtrate, Sodium Gluconate, Maltodextrin, Benzyl Alcohol, Fragrance/Parfum, Coumarin, Limonene, Linalool.

Complete Hydrating Air Dry Cream:
Water/Aqua/Eau, Squalane, Glycerin, Cinnamidopropyltrimonium Chloride, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Hydrogenated Farnesene, Salvia Hispanica Seed Extract, Linum Usitatissimum (Linseed) Seed Extract, Moringa Oleifera Seed Oil, Butyrospermum Parkii (Shea) Butter, Hydrolyzed Jojoba Esters, Sorbitan Oleate Decylglucoside Crosspolymer, Tocopherol, Maltodextrin/VP Copolymer, Potassium Sorbate, Ethylhexylglycerin, Benzyl Alcohol, Sodium Gluconate, Sodium Hydroxide, Fragrance/Parfum, Coumarin, Amyl Cinnamal, Citronellol, Hexyl Cinnamal, Hydroxycitronellal, Methyl Ionones, Eugenol, Linalool, Limonene.

Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category—this is not an exhaustive list):
Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytoluene (BHT) under 0.1%, Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Paraffin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos), Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1,4-Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1,4-Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%).